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U.S. Signs Preliminary $150 Million Equity Offer With xLight for EUV Laser Source

The preliminary equity offer backs a free-electron laser prototype to bolster domestic leadership in advanced lithography.

Overview

  • The Commerce Department’s CHIPS R&D Office signed a non-binding letter of intent to provide up to $150 million to xLight in exchange for equity.
  • The proposed funding would support development and demonstration of a particle-accelerator-driven free‑electron laser as an alternative EUV light source.
  • xLight plans to build its first system at the Albany Nanotech Complex while continuing joint work with Department of Energy labs.
  • The company says its source could connect to existing ASML scanners and improve efficiency, though integration and high‑volume manufacturing remain unproven.
  • Chaired by former Intel CEO Pat Gelsinger, the 2021 Palo Alto startup is set for the first CHIPS Act award of Trump’s second term, with some reports indicating the government could become its largest shareholder.