Overview

• TSMC executive Kevin Zhang said the company has yet to find a compelling reason to deploy High-NA EUV for its upcoming A14 process.
• Zhang noted that enhancements to current low-NA EUV machines can deliver substantial scaling benefits without the premium price of High-NA tools.
• Intel has committed to integrating ASML’s High-NA EUV scanners into its 14A manufacturing process to sharpen its competitive edge in contract chip production.
• ASML has shipped five High-NA EUV systems globally to customers including Intel, TSMC and Samsung.
• TSMC began accepting orders for its 2nm process earlier this year and targets mass production of its 1.4nm node by 2028.