TSMC to Install First High-NA EUV Lithography Machine This Month

The advanced €400 million tool will support TSMC's cutting-edge semiconductor R&D, despite initial reservations about cost.

TSMC will receive its first High-NA EUV lithography machine from ASML later this month.
The machine will be installed at TSMC's research and development center in Hsinchu, Taiwan.
High-NA EUV technology offers higher resolution for smaller circuits, crucial for advanced semiconductors.
Despite the hefty €400 million price tag, TSMC negotiated a near 20% discount on the tool.
The installation process will take several months, with a focus on developing future semiconductor technologies.