Overview
- SMIC has begun pilot runs using a Yuliangsheng-built deep‑ultraviolet lithography machine, according to the Financial Times.
- The tool is being used to pattern 28nm wafers with multi‑patterning intended to reach 7nm, a route constrained by lower yields than EUV.
- Sources say the machine could theoretically attempt 5nm at very low yield, underscoring the technical gap with leading EUV nodes.
- Most components are domestically sourced with some parts still imported, leaving full equipment independence incomplete.
- SMIC is targeting mass production using Chinese‑made tools as early as 2027 as China’s regulator expands an antitrust probe into Nvidia’s Mellanox deal.