Intel and ASML Achieve 'First Light' Milestone in High-NA Lithography Development

This critical step forward in chip manufacturing technology promises to enhance resolution and efficiency in future chip designs.

Intel and ASML have successfully reached the 'First Light' milestone with their High-NA EUV lithography system, marking a significant advancement in chip manufacturing technology.
The 'First Light' achievement indicates that the light source and mirrors of the High-NA EUV system are operational, though not yet at peak performance.
The High-NA EUV lithography system can achieve resolutions down to 8nm with a single exposure, improving upon the 13.5nm resolution of traditional Low-NA EUV systems.
ASML's first High-NA EUV lithography machine is located in Veldhoven, Netherlands, with a second machine being assembled at an Intel facility near Hillsboro, Oregon.
Leading chipmakers, including Intel, Samsung, and TSMC, are expected to adopt High-NA EUV lithography within the next few years, with Intel planning to use it for its 14A generation of chips.