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China Assembles EUV Chipmaking Prototype in Shenzhen, Reuters Reports

The test system generates EUV light with chip production targeted for 2028.

Overview

  • Reuters cites sources saying a factory-scale prototype was completed in early 2025 in Shenzhen, is undergoing tests, and has not yet produced working chips.
  • The effort is described as a state-led program with Huawei coordinating companies and institutes and with former ASML engineers involved in the build.
  • Sources say the team used older ASML components acquired on secondary markets and worked inside a high-security facility that enforced strict secrecy.
  • Beijing’s goal is to tape out chips by 2028, whereas many experts point to around 2030 given gaps in light-source power and precision optics compared with ASML’s commercial systems.
  • Market reports noted pressure on chip-related stocks, including AMD and Arm, as ASML reiterated that no EUV system has ever been sold to a customer in China.