Overview
- The China Institute of Atomic Energy disclosed the POWER-750H as the country’s first high-energy hydrogen ion implanter, describing performance on par with leading global tools.
- Ion implantation is a key chipmaking process that accelerates ions into silicon wafers, an area where China has depended on imported high-energy systems.
- The institute cites decades of nuclear physics and accelerator work and the use of tandem accelerator technology to achieve independent design and full system integration.
- Officials frame the tool as a step toward greater semiconductor self-reliance by addressing a critical bottleneck in domestic equipment supply.
- Analysts note real-world impact will hinge on external validation, commercial adoption in fabs, and scaling production of the new platform.