ASML Ships First High-NA EUV Lithography Scanner to Intel

The groundbreaking tool, worth up to $400 million, is expected to revolutionize chip production with its 8nm resolution capability.

ASML has shipped the industry's first High-NA EUV lithography scanner to Intel, a tool that is expected to revolutionize chip production.
The new scanner, worth between $300 million and $400 million, will be used by Intel to learn about its operation before deploying it for high-volume manufacturing in 2025.
The High-NA EUV scanner is capable of an 8nm resolution, a significant advancement over current EUV tools that offer a 13nm resolution.
The scanner will be moved from Veldhoven in the Netherlands to Intel's facility near Hillsboro, Oregon, USA, requiring 13 truck-sized containers and 250 crates for transportation.
Intel's acquisition of the High-NA EUV scanner could give it a significant advantage over competitors like TSMC and Samsung.